Vacuum Cluster 1
Vacuum Cluster #1 contains two GENII MBE chambers modified for 3” substrates along with an X-ray photoelectron spectroscopy (XPS) system.
-MBE1 - III-V compounds based on the AlGaInAsP materials.
-MBE2 (SiGe) – Includes direct current silicon sublimation source and standard germanium effusion cell.
-XPS: Al Kα monochromatic source with variable temperature stage (RT – 1000C).
MBE1 and MBE2 are interconnected to enable III-V/IV integration studies. Additionally, an in-line high resolution XPS chamber allows for in-situ chemical studies of pristine surfaces and interfaces.
Vacuum Cluster 2
Vacuum Cluster #2 contains a Veeco GEN930 system along with a Riber M7 MBE chamber. This vacuum system uses Veeco transfer and manipulator technology for both chambers.
-MBE3 - Plasma assisted MBE (PAMBE) for growth of III-V compounds based on AlGaInN materials.
- N2 plasma sources: System has both a Veeco and Riber plasma source.
-MBE4 – Plasma assisted MBE for wide bandgap oxides and spin materials.
- Spin metals include Fe and Pt.
MBE5 is a GEN930 chamber with the goal of producing 2D based nanostructures using GaSe, GaTe and MoWSe2 based materials.
-In-Situ analysis includes RHEED and Raman Spectroscopy